Electrical characterization of aluminum (Al) thin films measured by using four- point probe method
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ELECTRICAL CHARACTERIZATION OF ALUMINUM (Al) THIN FILMS MEASURED BY USING FOUR- POINT PROBE METHOD
This paper reports the results of electrical characterization of aluminum thin films. Uniform Al thin films were deposited by physical vapor deposition (PVD) technique on glass substrates. The electrical resistivity of the films as a function of film thickness was studied. These parameters have been measured by four-point probe method. The electrical resistivity was obtained by the measurement ...
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ژورنال
عنوان ژورنال: Kathmandu University Journal of Science, Engineering and Technology
سال: 2013
ISSN: 1816-8752
DOI: 10.3126/kuset.v8i2.7322